Optical And Euv Lithography di Andreas Erdmann edito da SPIE Press

Optical And Euv Lithography

A Modeling Perspective

Editore:

SPIE Press

EAN:

9781510639010

ISBN:

1510639012

Pagine:
374
Formato:
Paperback
Lingua:
Inglese
Acquistabile con la

Descrizione Optical And Euv Lithography

Introduces interested students with backgrounds in physics, optics, computational engineering, mathematics, chemistry, material science, nanotechnology, and other areas to the fascinating field of lithographic techniques for nanofabrication. It should also help senior engineers and managers expand their knowledge of alternative methods and applications.

Fuori catalogo - Non ordinabile
€ 74.00

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