Extreme Ultraviolet Lithography
- Editore:
SPIE Press
- Collana:
- SPIE Press Monographs
- EAN:
9781510639393
- ISBN:
151063939X
- Pagine:
- 245
- Formato:
- Paperback
- Lingua:
- Inglese
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Descrizione Extreme Ultraviolet Lithography
Covers the many aspects of lithographic technology that needed to be addressed in order to make EUV lithography ready for high-volume manufacturing: exposure tools, light sources, masks, resists, process control, metrology, and computational lithography. Each topic is approached from the perspective of a practicing lithographer.
Fuori catalogo - Non ordinabile
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