Advances in Chemical Mechanical Planarization (Cmp) edito da WOODHEAD PUB
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Advances in Chemical Mechanical Planarization (Cmp)

Editore:

WOODHEAD PUB

EAN:

9780128217917

ISBN:

012821791X

Pagine:
600
Formato:
Paperback
Lingua:
Inglese
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Descrizione Advances in Chemical Mechanical Planarization (Cmp)

Advances in Chemical Mechanical Planarization (CMP), Second Edition provides the latest information on a mainstream process that is critical for high-volume, high-yield semiconductor manufacturing, and even more so as device dimensions continue to shrink. The second edition includes the recent advances of CMP and its emerging materials, methods, and applications, including coverage of post-CMP cleaning challenges and tribology of CMP.

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